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dc.contributor.authorKleine-Ostmann, T.en_GB
dc.contributor.authorJastrow, C.en_GB
dc.contributor.authorSalhi, M.en_GB
dc.contributor.authorSchrader, T.en_GB
dc.contributor.authorHintzsche, H.en_GB
dc.contributor.authorStopper, H.en_GB
dc.contributor.authorKarst, U.en_GB
dc.contributor.authorHeinen, B.en_GB
dc.contributor.authorBaaske, K.en_GB
dc.contributor.authorKoch, M.en_GB
dc.date.accessioned2013-08-01T10:46:46Z
dc.date.available2013-08-01T10:46:46Z
dc.date.issued2013-08-01
dc.identifier.doi10.1109/ICIMW.2009.5324695
dc.identifier.urihttp://hdl.handle.net/2384/297200
dc.relation.urlhttp://ieeexplore.ieee.org/lpdocs/epic03/wrapper.htm?arnumber=5324695en_GB
dc.titleIn vitro field exposition of skin cells between 100 GHz and 2.52 THzen_GB
refterms.dateFOA2018-02-14T10:27:43Z


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